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1

The effect of isopropyl alcohol on etching rate and roughness of (1 0 0) Si surface etched in KOH and TMAH solutions

Irena Zubel, Małgorzata Kramkowska

Journal:

Sensors and Actuators A: Physical

Year:

2001

Language:

english

File:

PDF, 340 KB

english, 2001

2

Silicon anisotropic etching in KOH-isopropanol etchant

Irena Barycka, Irena Zubel

Journal:

Sensors and Actuators A: Physical

Year:

1995

File:

PDF, 1.29 MB

1995

3

Triton Surfactant as an Additive to KOH Silicon Etchant

Rola, Krzysztof P., Zubel, Irena

Journal:

Journal of Microelectromechanical Systems

Year:

2013

Language:

english

File:

PDF, 19.51 MB

english, 2013

4

Silicon anisotropic etching in alkaline solutions III: On the possibility of spatial structures forming in the course of Si(100) anisotropic etching in KOH and KOH+IPA solutions

Journal:

Sensors and Actuators A: Physical

Year:

2000

Language:

english

File:

PDF, 6.64 MB

english, 2000

5

Anisotropic etching of Si

Journal:

Journal of Micromechanics and Microengineering

Year:

2019

Language:

english

File:

PDF, 8.79 MB

english, 2019

6

The effect of isopropyl alcohol concentration on the etching process of Si-substrates in KOH solutions

Irena Zubel, Krzysztof Rola, Małgorzata Kramkowska

Journal:

Sensors and Actuators A: Physical

Year:

2011

Language:

english

File:

PDF, 2.68 MB

english, 2011

7

Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions

Rola, Krzysztof P., Zubel, Irena

Journal:

Microsystem Technologies

Year:

2013

Language:

english

File:

PDF, 2.12 MB

english, 2013

8

The effect of alcohol additives on etching characteristics in KOH solutions

Irena Zubel, Małgorzata Kramkowska

Journal:

Sensors and Actuators A: Physical

Year:

2002

Language:

english

File:

PDF, 303 KB

english, 2002

9

New 3-D Structures Fabricated on Si (hkl) Substrates by Bulk Micromachining

Zubel, Irena, Kramkowska, Malgorzata

Journal:

Journal of Microelectromechanical Systems

Year:

2007

Language:

english

File:

PDF, 933 KB

english, 2007

10

Silicon anisotropic etching in alkaline solutions I. The geometric description of figures developed under etching Si(100) in various solutions

Irena Zubel, Irena Barycka

Journal:

Sensors and Actuators A: Physical

Year:

1998

Language:

english

File:

PDF, 732 KB

english, 1998

11

Silicon anisotropic etching in alkaline solutions II on the influence of anisotropy on the smoothness of etched surfaces

Journal:

Sensors and Actuators A: Physical

Year:

1998

Language:

english

File:

PDF, 772 KB

english, 1998

12

The influence of atomic configuration of (h k l) planes on adsorption processes associated with anisotropic etching of silicon

Journal:

Sensors and Actuators A: Physical

Year:

2001

Language:

english

File:

PDF, 773 KB

english, 2001

13

Silicon anisotropic etching in TMAH solutions containing alcohol and surfactant additives

Irena Zubel, Małgorzata Kramkowska, Krzysztof Rola

Journal:

Sensors and Actuators A: Physical

Year:

2012

Language:

english

File:

PDF, 2.27 MB

english, 2012

14

Silicon anisotropic etching in alkaline solutions IV: The effect of organic and inorganic agents on silicon anisotropic etching process

Irena Zubel, Irena Barycka, Kamilla Kotowska, Małgorzata Kramkowska

Journal:

Sensors and Actuators A: Physical

Year:

2001

Language:

english

File:

PDF, 313 KB

english, 2001

15

The influence of surface damage etching on the properties of ion-impanted and thermally diffused non-single-crystal silicon solar cells

Andrzej Buczkowski, Tadeusz Z̵danowicz, Zubel Irena

Journal:

Year:

1984

Language:

english

File:

PDF, 1.32 MB

english, 1984

16

[IEEE 2011 International Students and Young Scientists Workshop "Photonics And Microsystems" - Cottbus, Germany (2011.07.8-2011.07.10)] 2011 International Students and Young Scientists Workshop "Photonics and Microsystems" - 45° micromirrors fabricated by silicon anisotropic etching in KOH solutions saturated with alcohols

Rola, Krzysztof P., Zubel, Irena

Year:

2011

Language:

english

File:

PDF, 1.42 MB

english, 2011

17

[IEEE 2014 15th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE) - Belgium (2014.04.7-2014.04.9)] 2014 15th International Conference on Thermal, Mechanical and Mulit-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE) - Adhesion work analysis by molecular modelling and wetting angle measurement

Allaf, Kamil Nouri, Jan Krol, Dawid, Wymyslowski, Artur, Zubel, Irena, Rola, Krzysztof

Year:

2014

Language:

english

File:

PDF, 1.20 MB

english, 2014

18

Texturization of Si(1 0 0) substrates using tensioactive compounds

Irena Zubel, Filip Granek, Krzysztof Rola, Katarzyna Banaszczyk

Journal:

Applied Surface Science

Year:

2012

Language:

english

File:

PDF, 1.21 MB

english, 2012

19

SPIE Proceedings [SPIE Optoelectronic and Electronic Sensors V - Rzeszow, Poland (Wednesday 5 June 2002)] Optoelectronic and Electronic Sensors V - Analysis of adsorption of alcohol additives in the process of silicon etching in alkaline solutions

Zubel, Irena, Kramkowska, Malgorzata, Kalita, Wlodzimierz

Year:

2003

Language:

english

File:

PDF, 534 KB

english, 2003

20

The effect of monohydric and polyhydric alcohols on silicon anisotropic etching in KOH solutions

Zubel, Irena, Rola, Krzysztof P.

Journal:

Sensors and Actuators A: Physical

Year:

2017

Language:

english

File:

PDF, 7.12 MB

english, 2017

21

Characterization of 45° Micromirrors Fabricated by Silicon Anisotropic Etching in Solutions Containing Different Organic Additives

Rola, Krzysztof, Ptasiński, Konrad, Zakrzewski, Adrian, Zubel, Irena

Journal:

Procedia Engineering

Year:

2012

Language:

english

File:

PDF, 615 KB

english, 2012

22

Effect of cations on silicon anisotropic etching process in solutions containing TMAH and TMAH with tensioactive compounds

Journal:

Sensors and Actuators A: Physical

Year:

2020

File:

PDF, 4.69 MB

2020

23

SPIE Proceedings [SPIE Optoelectronic and Electronic Sensors IV - Gliwice, Poland (Tuesday 13 June 2000)] Optoelectronic and Electronic Sensors IV - Compensation of convex corners in sensors with bossed structure etched in TMAH and TMAH+IPA solutions

Barycka, Irena, Dziuban, Jan, Kramkowska, Malgorzata, Zubel, Irena, Fraczek, Jerzy

Year:

2001

Language:

english

File:

PDF, 652 KB

english, 2001

24

SPIE Proceedings [SPIE Electron Technology Conference 2013 - Ryn, Poland (Tuesday 16 April 2013)] Electron Technology Conference 2013 - Application of Triton surfactant adsorption on Si surface for fabrication of 45° micromirrors

Rola, Krzysztof P., Zubel, Irena, Szczepanski, Pawel, Kisiel, Ryszard, Romaniuk, Ryszard S.

Year:

2013

Language:

english

File:

PDF, 1.02 MB

english, 2013

25

Effect of molecular structure of alcohols on wet anisotropic etching of silicon

Rola, Krzysztof P., Zubel, Irena

Journal:

Sensors and Actuators A: Physical

Year:

2016

Language:

english

File:

PDF, 1.60 MB

english, 2016

26

Chemical etching of (100) GaAs in the (NH4)2Cr2O7-H2SO4-N H4Cl-H2O system

Irena Barycka, Irena Zubel

Journal:

Journal of Materials Science

Year:

1986

Language:

english

File:

PDF, 489 KB

english, 1986

27

Silicon anisotropic etching in KOH and TMAH with modified surface tension

Malgorzata Kramkowska, Irena Zubel

Journal:

Procedia Chemistry

Year:

2009

Language:

english

File:

PDF, 621 KB

english, 2009

28

The Model of Etching of (hkl) Planes in Monocrystalline Silicon

Journal:

Journal of The Electrochemical Society

Year:

2003

Language:

english

File:

PDF, 258 KB

english, 2003

29

Modifying of etching anisotropy of silicon substrates by surface active agents

Krzysztof P. Rola, Irena Zubel

Journal:

Central European Journal of Physics

Year:

2011

Language:

english

File:

PDF, 1.55 MB

english, 2011

30

SPIE Proceedings [SPIE Electron Technology Conference 2013 - Ryn, Poland (Tuesday 16 April 2013)] Electron Technology Conference 2013 - Behavior of tensioactive compounds in the solutions for silicon anisotropic etching

Zubel, Irena, Rola, Krzysztof, Zalewska, Joanna, Szczepanski, Pawel, Kisiel, Ryszard, Romaniuk, Ryszard S.

Year:

2013

Language:

english

File:

PDF, 679 KB

english, 2013

31

Chemical etching of (100) GaAs in a sulphuric acid-hydrogen peroxide-water system

Irena Barycka, Irena Zubel

Journal:

Journal of Materials Science

Year:

1987

Language:

english

File:

PDF, 639 KB

english, 1987

32

Application of triton X-100 surfactant for silicon anisotropic etching in KOH-based solutions

Rola, Krzysztof P., Zubel, Irena

Journal:

Materials Science-Poland

Year:

2013

Language:

english

File:

PDF, 1.95 MB

english, 2013

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